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Dual-Diameter Variation –Immune CNFET-based 7T SRAM Cell
Aminul Islam, Mohd. Hasan
Pages - 1 - 14     |    Revised - 31-01-2011     |    Published - 08-02-2011
Volume - 1   Issue - 1    |    Publication Date - July / August 2011  Table of Contents
Namoelectronics, Nanotechnology, Nanotubes
This paper proposes a variation – tolerant dual-diameter CNFET-based 7T (seven transistor) SRAM (static random access memory) cell. The use of appropriate DCNT (diameter of CNFET) and hence Vt of CNFETs is a critical piece of our design strategy. In this work, dual-Vt and dual-diameter CNFETs have been used using suitable chiral vectors for appropriate transistors. It also investigates the impact of process, voltage and temperature variations on its design metrics and compares the results with its counterpart − CMOS-based 7T SRAM cell and standard 6T SRAM cell (only few parameters). The proposed SRAM cell offers 1.35× and 1.25× improvement in standby power on an average @ VDD = 1 V and 0.9 V respectively, 30% improvement in SNM (Static Noise Margin) over CMOS-based 7T cell. Proposed design outperforms 6T in terms of 71.4% improvement in RSNM and shows same read stability as its CMOS counterpart, It shows its robustness by offering 1.4× less spread in TRA (read access time) at 1 V and 1.2× less spread in TRA at 0.9 V than that of its CMOS counterpart at the expense of 1.6× read delay. The proposed bitcell also exhibits higher performance while writing (takes 1.3× and 1.2× less TWA (write access time) @ VDD = 1 V and VDD= 0.9 V respectively). It also proves its robustness against process variations by featuring tighter spread in TWA variability (1.4× and 1.2× @ VDD= 1 V and 0.9 V respectively).
CITED BY (2)  
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Associate Professor Aminul Islam
Birla Institute of Technology (deemed university) - India
Professor Mohd. Hasan
Aligarh Muslim University - India